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Unlocking the Potential of Hafnia Ferroelectrics: Achieving..:
Yang, Ketong
;
Jung, Minhyun
;
Jung, Taeseung
...
ACS Applied Electronic Materials. 6 (2024) 7 - p. 5067-5076 , 2024
Link:
https://doi.org/10.1021/acsaelm.4c00630
RT Journal T1
Unlocking the Potential of Hafnia Ferroelectrics: Achieving High Reliability via Plasma Frequency Modulation in Very High-Frequency Plasma-Enhanced Atomic Layer Deposition
UL https://suche.suub.uni-bremen.de/peid=cr-10.1021_acsaelm.4c00630&Exemplar=1&LAN=DE A1 Yang, Ketong A1 Jung, Minhyun A1 Jung, Taeseung A1 Yoon, Jae Seok A1 Hwang, Junghyeon A1 Shin, Hunbeom A1 Kim, Seungyeob A1 Kim, Chaeheon A1 Jeon, Sanghun PB American Chemical Society (ACS) YR 2024 SN 2637-6113 SN 2637-6113 JF ACS Applied Electronic Materials VO 6 IS 7 SP 5067 OP 5076 LK http://dx.doi.org/https://doi.org/10.1021/acsaelm.4c00630 DO https://doi.org/10.1021/acsaelm.4c00630 SF ELIB - SuUB Bremen
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