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Effect of the Bilayer Period of Atomic Layer Deposition on ..:
Lee, Sangbong
;
Kang, Yun-Ho
;
Kim, Min-Sik
...
ACS Applied Materials & Interfaces. 12 (2020) 35 - p. 39372-39380 , 2020
Link:
https://doi.org/10.1021/acsami.0c07540
RT Journal T1 <Title>Effect of the Bilayer Period of Atomic Layer Deposition on the Growth Behavior and Electrical Properties of the Amorphous In–Zn–O Film</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1021_acsami.0c07540&Exemplar=1&LAN=DE A1 Lee, Sangbong A1 Kang, Yun-Ho A1 Kim, Min-Sik A1 Lee, Hyerin A1 Cho, Yeong-Ho A1 Kim, Minsu A1 Yoon, Tae-Sik A1 Kim, Hyun-Mi A1 Kim, Ki-Bum PB American Chemical Society (ACS) YR 2020 SN 1944-8244 SN 1944-8252 JF ACS Applied Materials & Interfaces VO 12 IS 35 SP 39372 OP 39380 LK http://dx.doi.org/https://doi.org/10.1021/acsami.0c07540 DO https://doi.org/10.1021/acsami.0c07540 SF ELIB - SuUB Bremen
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