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Rapid and Reliable Formation of Highly Densified Bilayer Ox..:
Lee, Won-June
;
Choi, Jun-Gyu
;
Sung, Sujin
...
ACS Applied Materials & Interfaces. 13 (2021) 2 - p. 2820-2828 , 2021
Link:
https://doi.org/10.1021/acsami.0c18118
RT Journal T1 <Title>Rapid and Reliable Formation of Highly Densified Bilayer Oxide Dielectrics on Silicon Substrates via DUV Photoactivation for Low-Voltage Solution-Processed Oxide Thin-Film Transistors</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1021_acsami.0c18118&Exemplar=1&LAN=DE A1 Lee, Won-June A1 Choi, Jun-Gyu A1 Sung, Sujin A1 Kim, Chang-Hyun A1 Na, Sekwon A1 Joo, Young-Chang A1 Park, Sungjun A1 Yoon, Myung-Han PB American Chemical Society (ACS) YR 2021 SN 1944-8244 SN 1944-8252 JF ACS Applied Materials & Interfaces VO 13 IS 2 SP 2820 OP 2828 LK http://dx.doi.org/https://doi.org/10.1021/acsami.0c18118 DO https://doi.org/10.1021/acsami.0c18118 SF ELIB - SuUB Bremen
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