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Substrate Modification during Chemical Vapor Deposition of ..:
Bansal, Anushka
;
Hilse, Maria
;
Huet, Benjamin
...
ACS Applied Materials & Interfaces. 13 (2021) 45 - p. 54516-54526 , 2021
Link:
https://doi.org/10.1021/acsami.1c14591
RT Journal T1 <Title>Substrate Modification during Chemical Vapor Deposition of hBN on Sapphire</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1021_acsami.1c14591&Exemplar=1&LAN=DE A1 Bansal, Anushka A1 Hilse, Maria A1 Huet, Benjamin A1 Wang, Ke A1 Kozhakhmetov, Azimkhan A1 Kim, Ji Hyun A1 Bachu, Saiphaneendra A1 Alem, Nasim A1 Collazo, Ramon A1 Robinson, Joshua A. A1 Engel-Herbert, Roman A1 Redwing, Joan M. PB American Chemical Society (ACS) YR 2021 SN 1944-8244 SN 1944-8252 JF ACS Applied Materials & Interfaces VO 13 IS 45 SP 54516 OP 54526 LK http://dx.doi.org/https://doi.org/10.1021/acsami.1c14591 DO https://doi.org/10.1021/acsami.1c14591 SF ELIB - SuUB Bremen
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