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1 Ergebnisse
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Selective Pulsed Chemical Vapor Deposition of Water-Free Ti..:
Huang, James
;
Cho, Yunil
;
Zhang, Zichen
...
ACS Applied Materials & Interfaces. 14 (2022) 13 - p. 15716-15727 , 2022
Link:
https://doi.org/10.1021/acsami.1c19810
RT Journal T1 <Title>Selective Pulsed Chemical Vapor Deposition of Water-Free TiO2/Al2O3 and HfO2/Al2O3 Nanolaminates on Si and SiO2 in Preference to SiCOH</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1021_acsami.1c19810&Exemplar=1&LAN=DE A1 Huang, James A1 Cho, Yunil A1 Zhang, Zichen A1 Jan, Antony A1 Wong, Keith T. A1 Nemani, Srinivas D. A1 Yieh, Ellie A1 Kummel, Andrew C. PB American Chemical Society (ACS) YR 2022 SN 1944-8244 SN 1944-8252 JF ACS Applied Materials & Interfaces VO 14 IS 13 SP 15716 OP 15727 LK http://dx.doi.org/https://doi.org/10.1021/acsami.1c19810 DO https://doi.org/10.1021/acsami.1c19810 SF ELIB - SuUB Bremen
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