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Plasma-Enhanced Atomic Layer Deposition of HfO2 with Substr..:
Beladiya, Vivek
;
Faraz, Tahsin
;
Schmitt, Paul
...
ACS Applied Materials & Interfaces. 14 (2022) 12 - p. 14677-14692 , 2022
Link:
https://doi.org/10.1021/acsami.1c21889
RT Journal T1 <Title>Plasma-Enhanced Atomic Layer Deposition of HfO2 with Substrate Biasing: Thin Films for High-Reflective Mirrors</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1021_acsami.1c21889&Exemplar=1&LAN=DE A1 Beladiya, Vivek A1 Faraz, Tahsin A1 Schmitt, Paul A1 Munser, Anne-Sophie A1 Schröder, Sven A1 Riese, Sebastian A1 Mühlig, Christian A1 Schachtler, Daniel A1 Steger, Fabian A1 Botha, Roelene A1 Otto, Felix A1 Fritz, Torsten A1 van Helvoirt, Christian A1 Kessels, Wilhelmus M. M. A1 Gargouri, Hassan A1 Szeghalmi, Adriana PB American Chemical Society (ACS) YR 2022 SN 1944-8244 SN 1944-8252 JF ACS Applied Materials & Interfaces VO 14 IS 12 SP 14677 OP 14692 LK http://dx.doi.org/https://doi.org/10.1021/acsami.1c21889 DO https://doi.org/10.1021/acsami.1c21889 SF ELIB - SuUB Bremen
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