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1 Ergebnisse
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Aliovalent Ta-Doping-Engineered Oxygen Vacancy Configuratio..:
Barman, Arabinda
;
Das, Dip
;
Deshmukh, Sujit
...
ACS Applied Materials & Interfaces. 14 (2022) 30 - p. 34822-34834 , 2022
Link:
https://doi.org/10.1021/acsami.2c05089
RT Journal T1 <Title>Aliovalent Ta-Doping-Engineered Oxygen Vacancy Configurations for Ultralow-Voltage Resistive Memory Devices: A DFT-Supported Experimental Study</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1021_acsami.2c05089&Exemplar=1&LAN=DE A1 Barman, Arabinda A1 Das, Dip A1 Deshmukh, Sujit A1 Sarkar, Pranab Kumar A1 Banerjee, Debosmita A1 Hübner, René A1 Gupta, Mukul A1 Saini, Chetan Prakash A1 Kumar, Shammi A1 Johari, Priya A1 Dhar, Sankar A1 Kanjilal, Aloke PB American Chemical Society (ACS) YR 2022 SN 1944-8244 SN 1944-8252 JF ACS Applied Materials & Interfaces VO 14 IS 30 SP 34822 OP 34834 LK http://dx.doi.org/https://doi.org/10.1021/acsami.2c05089 DO https://doi.org/10.1021/acsami.2c05089 SF ELIB - SuUB Bremen
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