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ToF-SIMS Li Depth Profiling of Pure and Methylated Amorphou..:
Feng, Yue
;
Koo, Bon Min
;
Seyeux, Antoine
...
ACS Applied Materials & Interfaces. 14 (2022) 31 - p. 35716-35725 , 2022
Link:
https://doi.org/10.1021/acsami.2c08203
RT Journal T1
ToF-SIMS Li Depth Profiling of Pure and Methylated Amorphous Silicon Electrodes After Their Partial Lithiation
UL https://suche.suub.uni-bremen.de/peid=cr-10.1021_acsami.2c08203&Exemplar=1&LAN=DE A1 Feng, Yue A1 Koo, Bon Min A1 Seyeux, Antoine A1 Światowska, Jolanta A1 Henry de Villeneuve, Catherine A1 Rosso, Michel A1 Ozanam, François PB American Chemical Society (ACS) YR 2022 SN 1944-8244 SN 1944-8252 JF ACS Applied Materials & Interfaces VO 14 IS 31 SP 35716 OP 35725 LK http://dx.doi.org/https://doi.org/10.1021/acsami.2c08203 DO https://doi.org/10.1021/acsami.2c08203 SF ELIB - SuUB Bremen
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