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Remote Oxygen Scavenging of the Interfacial Oxide Layer in ..:
Tasneem, Nujhat
;
Kashyap, Harshil
;
Chae, Kisung
...
ACS Applied Materials & Interfaces. 14 (2022) 38 - p. 43897-43906 , 2022
Link:
https://doi.org/10.1021/acsami.2c11736
RT Journal T1 <Title>Remote Oxygen Scavenging of the Interfacial Oxide Layer in Ferroelectric Hafnium–Zirconium Oxide-Based Metal–Oxide–Semiconductor Structures</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1021_acsami.2c11736&Exemplar=1&LAN=DE A1 Tasneem, Nujhat A1 Kashyap, Harshil A1 Chae, Kisung A1 Park, Chinsung A1 Lee, Ping-che A1 Lombardo, Sarah F A1 Afroze, Nashrah A1 Tian, Mengkun A1 Kumarasubramanian, Harish A1 Hur, Jae A1 Chen, Hang A1 Chern, Winston A1 Yu, Shimeng A1 Bandaru, Prabhakar A1 Ravichandran, Jayakanth A1 Cho, Kyeongjae A1 Kacher, Josh A1 Kummel, Andrew C. A1 Khan, Asif Islam PB American Chemical Society (ACS) YR 2022 SN 1944-8244 SN 1944-8252 JF ACS Applied Materials & Interfaces VO 14 IS 38 SP 43897 OP 43906 LK http://dx.doi.org/https://doi.org/10.1021/acsami.2c11736 DO https://doi.org/10.1021/acsami.2c11736 SF ELIB - SuUB Bremen
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