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1 Ergebnisse
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Dielectric-on-Dielectric Achieved on SiO2 in Preference to ..:
Huang, James
;
Cho, Yunil
;
Wang, Victor
...
ACS Applied Materials & Interfaces. 15 (2023) 21 - p. 26128-26137 , 2023
Link:
https://doi.org/10.1021/acsami.3c02278
RT Journal T1 <Title>Dielectric-on-Dielectric Achieved on SiO2 in Preference to W by Water-free Chemical Vapor Depositions with Aniline Passivation</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1021_acsami.3c02278&Exemplar=1&LAN=DE A1 Huang, James A1 Cho, Yunil A1 Wang, Victor A1 Zhang, Zichen A1 Mu, Jing A1 Yadav, Ajay A1 Wong, Keith A1 Nemani, Srinivas A1 Yieh, Ellie A1 Andrew, Kummel PB American Chemical Society (ACS) YR 2023 SN 1944-8244 SN 1944-8252 JF ACS Applied Materials & Interfaces VO 15 IS 21 SP 26128 OP 26137 LK http://dx.doi.org/https://doi.org/10.1021/acsami.3c02278 DO https://doi.org/10.1021/acsami.3c02278 SF ELIB - SuUB Bremen
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