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1 Ergebnisse
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Mean Free Path of Electrons in Organic Photoresists for Ext..:
Fallica, Roberto
;
Mahne, Nicola
;
Conard, Thierry
...
ACS Applied Materials & Interfaces. 15 (2023) 29 - p. 35483-35494 , 2023
Link:
https://doi.org/10.1021/acsami.3c05884
RT Journal T1
Mean Free Path of Electrons in Organic Photoresists for Extreme Ultraviolet Lithography in the Kinetic Energy Range 20–450 eV
UL https://suche.suub.uni-bremen.de/peid=cr-10.1021_acsami.3c05884&Exemplar=1&LAN=DE A1 Fallica, Roberto A1 Mahne, Nicola A1 Conard, Thierry A1 Vanleenhove, Anja A1 de Simone, Danilo A1 Nannarone, Stefano PB American Chemical Society (ACS) YR 2023 SN 1944-8244 SN 1944-8252 JF ACS Applied Materials & Interfaces VO 15 IS 29 SP 35483 OP 35494 LK http://dx.doi.org/https://doi.org/10.1021/acsami.3c05884 DO https://doi.org/10.1021/acsami.3c05884 SF ELIB - SuUB Bremen
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