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1 Ergebnisse
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MoS2 as an Effective Cu Diffusion Barrier with a Back-End C..:
Kuo, Chi-Yuan
;
Chang, Ya-Ting
;
Huang, Yu-Ting
...
ACS Applied Materials & Interfaces. 15 (2023) 40 - p. 47845-47854 , 2023
Link:
https://doi.org/10.1021/acsami.3c12267
RT Journal T1 <Title>MoS2 as an Effective Cu Diffusion Barrier with a Back-End Compatible Process</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1021_acsami.3c12267&Exemplar=1&LAN=DE A1 Kuo, Chi-Yuan A1 Chang, Ya-Ting A1 Huang, Yu-Ting A1 Ni, I-Chih A1 Chen, Mei-Hsin A1 Wu, Chih-I PB American Chemical Society (ACS) YR 2023 SN 1944-8244 SN 1944-8252 JF ACS Applied Materials & Interfaces VO 15 IS 40 SP 47845 OP 47854 LK http://dx.doi.org/https://doi.org/10.1021/acsami.3c12267 DO https://doi.org/10.1021/acsami.3c12267 SF ELIB - SuUB Bremen
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