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1 Ergebnisse
1
Low-k SiOx/AlOx Nanolaminate Dielectric on Dielectric Achie..:
Huang, James
;
Mu, Jing
;
Cho, Yunil
...
ACS Applied Materials & Interfaces. 15 (2023) 48 - p. 56556-56566 , 2023
Link:
https://doi.org/10.1021/acsami.3c13973
RT Journal T1 <Title>Low-k SiOx/AlOx Nanolaminate Dielectric on Dielectric Achieved by Hybrid Pulsed Chemical Vapor Deposition</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1021_acsami.3c13973&Exemplar=1&LAN=DE A1 Huang, James A1 Mu, Jing A1 Cho, Yunil A1 Winter, Charles A1 Wang, Victor A1 Zhang, Zichen A1 Wang, Kesong A1 Kim, Chanyoung A1 Yadav, Ajay A1 Wong, Keith A1 Nemani, Srinivas A1 Yieh, Ellie A1 Kummel, Andrew PB American Chemical Society (ACS) YR 2023 SN 1944-8244 SN 1944-8252 JF ACS Applied Materials & Interfaces VO 15 IS 48 SP 56556 OP 56566 LK http://dx.doi.org/https://doi.org/10.1021/acsami.3c13973 DO https://doi.org/10.1021/acsami.3c13973 SF ELIB - SuUB Bremen
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