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High-Performance Ferroelectric Thin Film Transistors with L..:
Kim, Jae Young
;
Choi, Min-Ju
;
Lee, Yoon Jung
...
ACS Applied Materials & Interfaces. 16 (2024) 15 - p. 19057-19067 , 2024
Link:
https://doi.org/10.1021/acsami.3c16427
RT Journal T1 <Title>High-Performance Ferroelectric Thin Film Transistors with Large Memory Window Using Epitaxial Yttrium-Doped Hafnium Zirconium Gate Oxide</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1021_acsami.3c16427&Exemplar=1&LAN=DE A1 Kim, Jae Young A1 Choi, Min-Ju A1 Lee, Yoon Jung A1 Park, Sung Hyuk A1 Choi, Sungkyun A1 Baek, Ji Hyun A1 Im, In Hyuk A1 Kim, Seung Ju A1 Jang, Ho Won PB American Chemical Society (ACS) YR 2024 SN 1944-8244 SN 1944-8252 JF ACS Applied Materials & Interfaces VO 16 IS 15 SP 19057 OP 19067 LK http://dx.doi.org/https://doi.org/10.1021/acsami.3c16427 DO https://doi.org/10.1021/acsami.3c16427 SF ELIB - SuUB Bremen
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