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1 Ergebnisse
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Atmospheric Gas-Phase Catalyst Etching of SiO2 for Deep Mic..:
Sano, Ko-hei
;
Ono, Yoshitaka
;
Tobinaga, Ryosuke
...
ACS Applied Materials & Interfaces. 16 (2024) 17 - p. 22657-22664 , 2024
Link:
https://doi.org/10.1021/acsami.4c01291
RT Journal T1 <Title>Atmospheric Gas-Phase Catalyst Etching of SiO2 for Deep Microfabrication Using HF Gas and Patterned Photoresist</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1021_acsami.4c01291&Exemplar=1&LAN=DE A1 Sano, Ko-hei A1 Ono, Yoshitaka A1 Tobinaga, Ryosuke A1 Imamura, Yutaka A1 Hayashi, Yasuo A1 Yanagitani, Takahiko PB American Chemical Society (ACS) YR 2024 SN 1944-8244 SN 1944-8252 JF ACS Applied Materials & Interfaces VO 16 IS 17 SP 22657 OP 22664 LK http://dx.doi.org/https://doi.org/10.1021/acsami.4c01291 DO https://doi.org/10.1021/acsami.4c01291 SF ELIB - SuUB Bremen
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