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1 Ergebnisse
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III-Nitride Magnetron Sputter Epitaxy on Si: Controlling Mo..:
Pingen, Katrin
;
Wolff, Niklas
;
Mohammadian, Zahra
...
ACS Applied Materials & Interfaces. 16 (2024) 26 - p. 34294-34302 , 2024
Link:
https://doi.org/10.1021/acsami.4c03112
RT Journal T1
III-Nitride Magnetron Sputter Epitaxy on Si: Controlling Morphology, Crystal Quality, and Polarity Using Al Seed Layers
UL https://suche.suub.uni-bremen.de/peid=cr-10.1021_acsami.4c03112&Exemplar=1&LAN=DE A1 Pingen, Katrin A1 Wolff, Niklas A1 Mohammadian, Zahra A1 Sandström, Per A1 Beuer, Susanne A1 von Hauff, Elizabeth A1 Kienle, Lorenz A1 Hultman, Lars A1 Birch, Jens A1 Hsiao, Ching-Lien A1 Hinz, Alexander M. PB American Chemical Society (ACS) YR 2024 SN 1944-8244 SN 1944-8252 JF ACS Applied Materials & Interfaces VO 16 IS 26 SP 34294 OP 34302 LK http://dx.doi.org/https://doi.org/10.1021/acsami.4c03112 DO https://doi.org/10.1021/acsami.4c03112 SF ELIB - SuUB Bremen
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