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Resilient Growth of a Highly Crystalline Topological Insula..:
Xie, Renjie
;
Ge, Min
;
Xiao, Shaozhu
...
ACS Applied Materials & Interfaces. 16 (2024) 26 - p. 34386-34392 , 2024
Link:
https://doi.org/10.1021/acsami.4c05656
RT Journal T1 <Title>Resilient Growth of a Highly Crystalline Topological Insulator–Superconductor Heterostructure Enabled by an Ex Situ Nitride Film</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1021_acsami.4c05656&Exemplar=1&LAN=DE A1 Xie, Renjie A1 Ge, Min A1 Xiao, Shaozhu A1 Zhang, Jiahui A1 Bi, Jiachang A1 Yuan, Xiaoyu A1 Yi, Hee Taek A1 Wang, Baomin A1 Oh, Seongshik A1 Cao, Yanwei A1 Yao, Xiong PB American Chemical Society (ACS) YR 2024 SN 1944-8244 SN 1944-8252 JF ACS Applied Materials & Interfaces VO 16 IS 26 SP 34386 OP 34392 LK http://dx.doi.org/https://doi.org/10.1021/acsami.4c05656 DO https://doi.org/10.1021/acsami.4c05656 SF ELIB - SuUB Bremen
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