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1 Ergebnisse
1
A Study on the Electrical Properties of Atomic Layer Deposi..:
Sheng, Jiazhen
;
Park, Jozeph
;
Choi, Dong-won
..
ACS Applied Materials & Interfaces. 8 (2016) 45 - p. 31136-31143 , 2016
Link:
https://doi.org/10.1021/acsami.6b11815
RT Journal T1 <Title>A Study on the Electrical Properties of Atomic Layer Deposition Grown InOx on Flexible Substrates with Respect to N2O Plasma Treatment and the Associated Thin-Film Transistor Behavior under Repetitive Mechanical Stress</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1021_acsami.6b11815&Exemplar=1&LAN=DE A1 Sheng, Jiazhen A1 Park, Jozeph A1 Choi, Dong-won A1 Lim, Junhyung A1 Park, Jin-Seong PB American Chemical Society (ACS) YR 2016 SN 1944-8244 SN 1944-8252 JF ACS Applied Materials & Interfaces VO 8 IS 45 SP 31136 OP 31143 LK http://dx.doi.org/https://doi.org/10.1021/acsami.6b11815 DO https://doi.org/10.1021/acsami.6b11815 SF ELIB - SuUB Bremen
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