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Reliable Multivalued Conductance States in TaOx Memristors ..:
Lee, Myoung-Jae
;
Park, Gyeong-Su
;
Seo, David H.
...
ACS Applied Materials & Interfaces. 10 (2018) 35 - p. 29757-29765 , 2018
Link:
https://doi.org/10.1021/acsami.8b09046
RT Journal T1 <Title>Reliable Multivalued Conductance States in TaOx Memristors through Oxygen Plasma-Assisted Electrode Deposition with in Situ-Biased Conductance State Transmission Electron Microscopy Analysis</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1021_acsami.8b09046&Exemplar=1&LAN=DE A1 Lee, Myoung-Jae A1 Park, Gyeong-Su A1 Seo, David H. A1 Kwon, Sung Min A1 Lee, Hyeon-Jun A1 Kim, June-Seo A1 Jung, MinKyung A1 You, Chun-Yeol A1 Lee, Hyangsook A1 Kim, Hee-Goo A1 Pang, Su-Been A1 Seo, Sunae A1 Hwang, Hyunsang A1 Park, Sung Kyu PB American Chemical Society (ACS) YR 2018 SN 1944-8244 SN 1944-8252 JF ACS Applied Materials & Interfaces VO 10 IS 35 SP 29757 OP 29765 LK http://dx.doi.org/https://doi.org/10.1021/acsami.8b09046 DO https://doi.org/10.1021/acsami.8b09046 SF ELIB - SuUB Bremen
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