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Effects of Ar Addition to O2 Plasma on Plasma-Enhanced Atom..:
Jung, Hanearl
;
Oh, Il-Kwon
;
Yoon, Chang Mo
...
ACS Applied Materials & Interfaces. 10 (2018) 46 - p. 40286-40293 , 2018
Link:
https://doi.org/10.1021/acsami.8b14244
RT Journal T1 <Title>Effects of Ar Addition to O2 Plasma on Plasma-Enhanced Atomic Layer Deposition of Oxide Thin Films</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1021_acsami.8b14244&Exemplar=1&LAN=DE A1 Jung, Hanearl A1 Oh, Il-Kwon A1 Yoon, Chang Mo A1 Park, Bo-Eun A1 Lee, Sanghun A1 Kwon, Ohyung A1 Lee, Woo Jae A1 Kwon, Se-Hun A1 Kim, Woo-Hee A1 Kim, Hyungjun PB American Chemical Society (ACS) YR 2018 SN 1944-8244 SN 1944-8252 JF ACS Applied Materials & Interfaces VO 10 IS 46 SP 40286 OP 40293 LK http://dx.doi.org/https://doi.org/10.1021/acsami.8b14244 DO https://doi.org/10.1021/acsami.8b14244 SF ELIB - SuUB Bremen
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