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Stable Subloop Behavior in Ferroelectric Si-Doped HfO2:
Lee, Kyoungjun
;
Lee, Hyun-Jae
;
Lee, Tae Yoon
...
ACS Applied Materials & Interfaces. 11 (2019) 42 - p. 38929-38936 , 2019
Link:
https://doi.org/10.1021/acsami.9b12878
RT Journal T1 <Title>Stable Subloop Behavior in Ferroelectric Si-Doped HfO2</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1021_acsami.9b12878&Exemplar=1&LAN=DE A1 Lee, Kyoungjun A1 Lee, Hyun-Jae A1 Lee, Tae Yoon A1 Lim, Hong Heon A1 Song, Myeong Seop A1 Yoo, Hyang Keun A1 Suh, Dong Ik A1 Lee, Jae Gil A1 Zhu, Zhongwei A1 Yoon, Alexander A1 MacDonald, Matthew R. A1 Lei, Xinjian A1 Park, Kunwoo A1 Park, Jungwon A1 Lee, Jun Hee A1 Chae, Seung Chul PB American Chemical Society (ACS) YR 2019 SN 1944-8244 SN 1944-8252 JF ACS Applied Materials & Interfaces VO 11 IS 42 SP 38929 OP 38936 LK http://dx.doi.org/https://doi.org/10.1021/acsami.9b12878 DO https://doi.org/10.1021/acsami.9b12878 SF ELIB - SuUB Bremen
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