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1 Ergebnisse
1
Nonchemically Amplified Molecular Resists Based on Sulfoniu..:
Wang, Yake
;
Chen, Jinping
;
Zeng, Yi
...
ACS Applied Nano Materials. 6 (2023) 19 - p. 18480-18490 , 2023
Link:
https://doi.org/10.1021/acsanm.3c03900
RT Journal T1
Nonchemically Amplified Molecular Resists Based on Sulfonium-Functionalized Sulfone Derivatives for Sub-13 nm Nanolithography
UL https://suche.suub.uni-bremen.de/peid=cr-10.1021_acsanm.3c03900&Exemplar=1&LAN=DE A1 Wang, Yake A1 Chen, Jinping A1 Zeng, Yi A1 Yu, Tianjun A1 Wang, Shuangqing A1 Guo, Xudong A1 Hu, Rui A1 Tian, Peng A1 Vockenhuber, Michaela A1 Kazazis, Dimitrios A1 Ekinci, Yasin A1 Wu, Yanqing A1 Yang, Shumin A1 Zhao, Jun A1 Yang, Guoqiang A1 Li, Yi PB American Chemical Society (ACS) YR 2023 SN 2574-0970 SN 2574-0970 JF ACS Applied Nano Materials VO 6 IS 19 SP 18480 OP 18490 LK http://dx.doi.org/https://doi.org/10.1021/acsanm.3c03900 DO https://doi.org/10.1021/acsanm.3c03900 SF ELIB - SuUB Bremen
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