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1 Ergebnisse
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I4/mcm-Si48: An Ideal Topological Nodal-Line Semimetal:
Su, Laiyuan
;
Li, Shifang
;
Li, Jin
...
ACS Materials Letters. 4 (2022) 9 - p. 1726-1733 , 2022
Link:
https://doi.org/10.1021/acsmaterialslett.2c00333
RT Journal T1
I4/mcm-Si48: An Ideal Topological Nodal-Line Semimetal
UL https://suche.suub.uni-bremen.de/peid=cr-10.1021_acsmaterialslett.2c00333&Exemplar=1&LAN=DE A1 Su, Laiyuan A1 Li, Shifang A1 Li, Jin A1 He, Chaoyu A1 Zeng, Xu-Tao A1 Sheng, Xian-Lei A1 Ouyang, Tao A1 Chunxiao Zhang A1 Tang, Chao A1 Zhong, Jianxin PB American Chemical Society (ACS) YR 2022 SN 2639-4979 SN 2639-4979 JF ACS Materials Letters VO 4 IS 9 SP 1726 OP 1733 LK http://dx.doi.org/https://doi.org/10.1021/acsmaterialslett.2c00333 DO https://doi.org/10.1021/acsmaterialslett.2c00333 SF ELIB - SuUB Bremen
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