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1 Ergebnisse
1
Precursor-Confined Chemical Vapor Deposition of 2D Single-C..:
Huang, Haoxin
;
Zha, Jiajia
;
Xu, Songcen
...
ACS Nano. , 2024
Link:
https://doi.org/10.1021/acsnano.4c05323
RT Journal T1
Precursor-Confined Chemical Vapor Deposition of 2D Single-Crystalline SexTe1–x Nanosheets for p-Type Transistors and Inverters
UL https://suche.suub.uni-bremen.de/peid=cr-10.1021_acsnano.4c05323&Exemplar=1&LAN=DE A1 Huang, Haoxin A1 Zha, Jiajia A1 Xu, Songcen A1 Yang, Peng A1 Xia, Yunpeng A1 Wang, Huide A1 Dong, Dechen A1 Zheng, Long A1 Yao, Yao A1 Zhang, Yuxuan A1 Chen, Ye A1 Ho, Johnny C. A1 Chan, Hau Ping A1 Zhao, Chunsong A1 Tan, Chaoliang PB American Chemical Society (ACS) YR 2024 SN 1936-0851 SN 1936-086X JF ACS Nano LK http://dx.doi.org/https://doi.org/10.1021/acsnano.4c05323 DO https://doi.org/10.1021/acsnano.4c05323 SF ELIB - SuUB Bremen
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