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1 Ergebnisse
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Molecular Dynamics Simulation of Silicon Dioxide Etching by..:
Kim, Dong Hyun
;
Kwak, Seung Jae
;
Jeong, Jae Hun
...
ACS Omega. 6 (2021) 24 - p. 16009-16015 , 2021
Link:
https://doi.org/10.1021/acsomega.1c01824
RT Journal T1
Molecular Dynamics Simulation of Silicon Dioxide Etching by Hydrogen Fluoride Using the Reactive Force Field
UL https://suche.suub.uni-bremen.de/peid=cr-10.1021_acsomega.1c01824&Exemplar=1&LAN=DE A1 Kim, Dong Hyun A1 Kwak, Seung Jae A1 Jeong, Jae Hun A1 Yoo, Suyoung A1 Nam, Sang Ki A1 Kim, YongJoo A1 Lee, Won Bo PB American Chemical Society (ACS) YR 2021 SN 2470-1343 SN 2470-1343 JF ACS Omega VO 6 IS 24 SP 16009 OP 16015 LK http://dx.doi.org/https://doi.org/10.1021/acsomega.1c01824 DO https://doi.org/10.1021/acsomega.1c01824 SF ELIB - SuUB Bremen
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