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Effects of Nitrogen Incorporation in HfO2 Grown on InP by A..:
Kang, Yu-Seon
;
Kim, Dae-Kyoung
;
Kang, Hang-Kyu
...
ACS Applied Materials & Interfaces. 6 (2014) 6 - p. 3896-3906 , 2014
Link:
https://doi.org/10.1021/am4049496
RT Journal T1 <Title>Effects of Nitrogen Incorporation in HfO2 Grown on InP by Atomic Layer Deposition: An Evolution in Structural, Chemical, and Electrical Characteristics</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1021_am4049496&Exemplar=1&LAN=DE A1 Kang, Yu-Seon A1 Kim, Dae-Kyoung A1 Kang, Hang-Kyu A1 Jeong, Kwang-Sik A1 Cho, Mann-Ho A1 Ko, Dae-Hong A1 Kim, Hyoungsub A1 Seo, Jung-Hye A1 Kim, Dong-Chan PB American Chemical Society (ACS) YR 2014 SN 1944-8244 SN 1944-8252 JF ACS Applied Materials & Interfaces VO 6 IS 6 SP 3896 OP 3906 LK http://dx.doi.org/https://doi.org/10.1021/am4049496 DO https://doi.org/10.1021/am4049496 SF ELIB - SuUB Bremen
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