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Interface Properties of Atomic Layer Deposited TiO2/Al2O3 F..:
Mukherjee, C.
;
Das, T.
;
Mahata, C.
...
ACS Applied Materials & Interfaces. 6 (2014) 5 - p. 3263-3274 , 2014
Link:
https://doi.org/10.1021/am405019d
RT Journal T1 <Title>Interface Properties of Atomic Layer Deposited TiO2/Al2O3 Films on In0.53Ga0.47As/InP Substrates</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1021_am405019d&Exemplar=1&LAN=DE A1 Mukherjee, C. A1 Das, T. A1 Mahata, C. A1 Maiti, C. K. A1 Chia, C. K. A1 Chiam, S. Y. A1 Chi, D. Z. A1 Dalapati, G. K. PB American Chemical Society (ACS) YR 2014 SN 1944-8244 SN 1944-8252 JF ACS Applied Materials & Interfaces VO 6 IS 5 SP 3263 OP 3274 LK http://dx.doi.org/https://doi.org/10.1021/am405019d DO https://doi.org/10.1021/am405019d SF ELIB - SuUB Bremen
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