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Reducing Adhesion Force by Means of Atomic Layer Deposition..:
Chai, Zhimin
;
Liu, Yuhong
;
Lu, Xinchun
.
ACS Applied Materials & Interfaces. 6 (2014) 5 - p. 3325-3330 , 2014
Link:
https://doi.org/10.1021/am4053333
RT Journal T1 <Title>Reducing Adhesion Force by Means of Atomic Layer Deposition of ZnO Films with Nanoscale Surface Roughness</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1021_am4053333&Exemplar=1&LAN=DE A1 Chai, Zhimin A1 Liu, Yuhong A1 Lu, Xinchun A1 He, Dannong PB American Chemical Society (ACS) YR 2014 SN 1944-8244 SN 1944-8252 JF ACS Applied Materials & Interfaces VO 6 IS 5 SP 3325 OP 3330 LK http://dx.doi.org/https://doi.org/10.1021/am4053333 DO https://doi.org/10.1021/am4053333 SF ELIB - SuUB Bremen
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