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1 Ergebnisse
1
Polymer-Confined Colloidal Monolayer: A Reusable Soft Photo..:
Fang, Ming
;
Lin, Hao
;
Cheung, Ho-Yuen
...
ACS Applied Materials & Interfaces. 6 (2014) 23 - p. 20837-20841 , 2014
Link:
https://doi.org/10.1021/am505221g
RT Journal T1 <Title>Polymer-Confined Colloidal Monolayer: A Reusable Soft Photomask for Rapid Wafer-Scale Nanopatterning</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1021_am505221g&Exemplar=1&LAN=DE A1 Fang, Ming A1 Lin, Hao A1 Cheung, Ho-Yuen A1 Xiu, Fei A1 Shen, Lifan A1 Yip, SenPo A1 Pun, Edwin Yue-Bun A1 Wong, Chun-Yuen A1 Ho, Johnny C. PB American Chemical Society (ACS) YR 2014 SN 1944-8244 SN 1944-8252 JF ACS Applied Materials & Interfaces VO 6 IS 23 SP 20837 OP 20841 LK http://dx.doi.org/https://doi.org/10.1021/am505221g DO https://doi.org/10.1021/am505221g SF ELIB - SuUB Bremen
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