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1 Ergebnisse
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High Aspect Ratio PS-b-PMMA Block Copolymer Masks for Litho..:
Ferrarese Lupi, F.
;
Giammaria, T. J.
;
Volpe, F. G.
...
ACS Applied Materials & Interfaces. 6 (2014) 23 - p. 21389-21396 , 2014
Link:
https://doi.org/10.1021/am506391n
RT Journal T1 <Title>High Aspect Ratio PS-b-PMMA Block Copolymer Masks for Lithographic Applications</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1021_am506391n&Exemplar=1&LAN=DE A1 Ferrarese Lupi, F. A1 Giammaria, T. J. A1 Volpe, F. G. A1 Lotto, F. A1 Seguini, G. A1 Pivac, B. A1 Laus, M. A1 Perego, M. PB American Chemical Society (ACS) YR 2014 SN 1944-8244 SN 1944-8252 JF ACS Applied Materials & Interfaces VO 6 IS 23 SP 21389 OP 21396 LK http://dx.doi.org/https://doi.org/10.1021/am506391n DO https://doi.org/10.1021/am506391n SF ELIB - SuUB Bremen
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