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Diffusion of Copper in Nanoporous Dielectric Films:
Rodriguez, Oscar
;
Saxena, Ravi
;
Cho, Woojin
..
Industrial & Engineering Chemistry Research. 44 (2004) 5 - p. 1220-1225 , 2004
Link:
https://doi.org/10.1021/ie049554r
RT Journal T1 <Title>Diffusion of Copper in Nanoporous Dielectric Films</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1021_ie049554r&Exemplar=1&LAN=DE A1 Rodriguez, Oscar A1 Saxena, Ravi A1 Cho, Woojin A1 Plawsky, Joel L. A1 Gill, William N. PB American Chemical Society (ACS) YR 2004 SN 0888-5885 SN 1520-5045 JF Industrial & Engineering Chemistry Research VO 44 IS 5 SP 1220 OP 1225 LK http://dx.doi.org/https://doi.org/10.1021/ie049554r DO https://doi.org/10.1021/ie049554r SF ELIB - SuUB Bremen
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