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Pressure Effects in the Isoelectronic REFe0.85Ir0.15AsO Sys..:
Maroni, Beatrice
;
Di Castro, Daniele
;
Hanfland, Michael
...
Journal of the American Chemical Society. 133 (2011) 10 - p. 3252-3255 , 2011
Link:
https://doi.org/10.1021/ja1098808
RT Journal T1 <Title>Pressure Effects in the Isoelectronic REFe0.85Ir0.15AsO System</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1021_ja1098808&Exemplar=1&LAN=DE A1 Maroni, Beatrice A1 Di Castro, Daniele A1 Hanfland, Michael A1 Boby, Joseph A1 Vercesi, Cristiano A1 Mozzati, M. Cristina A1 Weyeneth, Stephen A1 Keller, Hugo A1 Khasanov, Rustem A1 Drathen, Christina A1 Dore, Paolo A1 Postorino, Paolo A1 Malavasi, Lorenzo PB American Chemical Society (ACS) YR 2011 SN 0002-7863 SN 1520-5126 JF Journal of the American Chemical Society VO 133 IS 10 SP 3252 OP 3255 LK http://dx.doi.org/https://doi.org/10.1021/ja1098808 DO https://doi.org/10.1021/ja1098808 SF ELIB - SuUB Bremen
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