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1 Ergebnisse
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Reduction of Incubation Period by Employing OH-Terminated S..:
Lee, Sun S.
;
Baik, Jae Y.
;
An, Ki-Seok
...
The Journal of Physical Chemistry B. 108 (2004) 39 - p. 15128-15132 , 2004
Link:
https://doi.org/10.1021/jp048038b
RT Journal T1 <Title>Reduction of Incubation Period by Employing OH-Terminated Si(001) Substrates in the Atomic Layer Deposition of Al2O3</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1021_jp048038b&Exemplar=1&LAN=DE A1 Lee, Sun S. A1 Baik, Jae Y. A1 An, Ki-Seok A1 Suh, Yung D. A1 Oh, Jin-Ho A1 Kim, Yunsoo PB American Chemical Society (ACS) YR 2004 SN 1520-6106 SN 1520-5207 JF The Journal of Physical Chemistry B VO 108 IS 39 SP 15128 OP 15132 LK http://dx.doi.org/https://doi.org/10.1021/jp048038b DO https://doi.org/10.1021/jp048038b SF ELIB - SuUB Bremen
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