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Model for the Mass Transport during Metal-Assisted Chemical..:
Geyer, Nadine
;
Fuhrmann, Bodo
;
Huang, Zhipeng
...
The Journal of Physical Chemistry C. 116 (2012) 24 - p. 13446-13451 , 2012
Link:
https://doi.org/10.1021/jp3034227
RT Journal T1 <Title>Model for the Mass Transport during Metal-Assisted Chemical Etching with Contiguous Metal Films As Catalysts</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1021_jp3034227&Exemplar=1&LAN=DE A1 Geyer, Nadine A1 Fuhrmann, Bodo A1 Huang, Zhipeng A1 de Boor, Johannes A1 Leipner, Hartmut S. A1 Werner, Peter PB American Chemical Society (ACS) YR 2012 SN 1932-7447 SN 1932-7455 JF The Journal of Physical Chemistry C VO 116 IS 24 SP 13446 OP 13451 LK http://dx.doi.org/https://doi.org/10.1021/jp3034227 DO https://doi.org/10.1021/jp3034227 SF ELIB - SuUB Bremen
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