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Controlling the Atomic Layer Deposition of Titanium Dioxide..:
McDonnell, Stephen
;
Longo, Roberto C.
;
Seitz, Oliver
...
The Journal of Physical Chemistry C. 117 (2013) 39 - p. 20250-20259 , 2013
Link:
https://doi.org/10.1021/jp4060022
RT Journal T1 <Title>Controlling the Atomic Layer Deposition of Titanium Dioxide on Silicon: Dependence on Surface Termination</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1021_jp4060022&Exemplar=1&LAN=DE A1 McDonnell, Stephen A1 Longo, Roberto C. A1 Seitz, Oliver A1 Ballard, Josh B. A1 Mordi, Greg A1 Dick, Don A1 Owen, James H. G. A1 Randall, John N. A1 Kim, Jiyoung A1 Chabal, Yves J. A1 Cho, Kyeongjae A1 Wallace, Robert M. PB American Chemical Society (ACS) YR 2013 SN 1932-7447 SN 1932-7455 JF The Journal of Physical Chemistry C VO 117 IS 39 SP 20250 OP 20259 LK http://dx.doi.org/https://doi.org/10.1021/jp4060022 DO https://doi.org/10.1021/jp4060022 SF ELIB - SuUB Bremen
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