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Rapid Selective Etching of PMMA Residues from Transferred G..:
Gong, Cheng
;
Floresca, Herman Carlo
;
Hinojos, David
...
The Journal of Physical Chemistry C. 117 (2013) 44 - p. 23000-23008 , 2013
Link:
https://doi.org/10.1021/jp408429v
RT Journal T1 <Title>Rapid Selective Etching of PMMA Residues from Transferred Graphene by Carbon Dioxide</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1021_jp408429v&Exemplar=1&LAN=DE A1 Gong, Cheng A1 Floresca, Herman Carlo A1 Hinojos, David A1 McDonnell, Stephen A1 Qin, Xiaoye A1 Hao, Yufeng A1 Jandhyala, Srikar A1 Mordi, Greg A1 Kim, Jiyoung A1 Colombo, Luigi A1 Ruoff, Rodney S. A1 Kim, Moon J. A1 Cho, Kyeongjae A1 Wallace, Robert M. A1 Chabal, Yves J. PB American Chemical Society (ACS) YR 2013 SN 1932-7447 SN 1932-7455 JF The Journal of Physical Chemistry C VO 117 IS 44 SP 23000 OP 23008 LK http://dx.doi.org/https://doi.org/10.1021/jp408429v DO https://doi.org/10.1021/jp408429v SF ELIB - SuUB Bremen
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