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High Index Resist for 193 nm Immersion Lithography:
Matsumoto, Kazuya
;
Costner, Elizabeth A.
;
Nishimura, Isao
..
Macromolecules. 41 (2008) 15 - p. 5674-5680 , 2008
Link:
https://doi.org/10.1021/ma800295s
RT Journal T1
High Index Resist for 193 nm Immersion Lithography
UL https://suche.suub.uni-bremen.de/peid=cr-10.1021_ma800295s&Exemplar=1&LAN=DE A1 Matsumoto, Kazuya A1 Costner, Elizabeth A. A1 Nishimura, Isao A1 Ueda, Mitsuru A1 Willson, C. Grant PB American Chemical Society (ACS) YR 2008 SN 0024-9297 SN 1520-5835 JF Macromolecules VO 41 IS 15 SP 5674 OP 5680 LK http://dx.doi.org/https://doi.org/10.1021/ma800295s DO https://doi.org/10.1021/ma800295s SF ELIB - SuUB Bremen
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