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Mapping of the mechanical response in Si/SiGe nanosheet dev..:
Murray, Conal E.
;
Yan, Hanfei
;
Lavoie, Christian
...
Communications Engineering. 1 (2022) 1 - p. , 2022
Link:
https://doi.org/10.1038/s44172-022-00011-w
RT Journal T1
Mapping of the mechanical response in Si/SiGe nanosheet device geometries
UL https://suche.suub.uni-bremen.de/peid=cr-10.1038_s44172-022-00011-w&Exemplar=1&LAN=DE A1 Murray, Conal E. A1 Yan, Hanfei A1 Lavoie, Christian A1 Jordan-Sweet, Jean A1 Pattammattel, Ajith A1 Reuter, Kathleen A1 Hasanuzzaman, Mohammad A1 Lanzillo, Nicholas A1 Robison, Robert A1 Loubet, Nicolas PB Springer Science and Business Media LLC YR 2022 SN 2731-3395 JF Communications Engineering VO 1 IS 1 LK http://dx.doi.org/https://doi.org/10.1038/s44172-022-00011-w DO https://doi.org/10.1038/s44172-022-00011-w SF ELIB - SuUB Bremen
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