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1 Ergebnisse
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Graphene as an atomically thin barrier to Cu diffusion into..:
Hong, Juree
;
Lee, Sanggeun
;
Lee, Seulah
...
Nanoscale. 6 (2014) 13 - p. 7503-7511 , 2014
Link:
https://doi.org/10.1039/c3nr06771h
RT Journal T1
Graphene as an atomically thin barrier to Cu diffusion into Si
UL https://suche.suub.uni-bremen.de/peid=cr-10.1039_c3nr06771h&Exemplar=1&LAN=DE A1 Hong, Juree A1 Lee, Sanggeun A1 Lee, Seulah A1 Han, Heetak A1 Mahata, Chandreswar A1 Yeon, Han-Wool A1 Koo, Bonwoong A1 Kim, Seong-Il A1 Nam, Taewook A1 Byun, Kisik A1 Min, Byung-Wook A1 Kim, Young-Woon A1 Kim, Hyungjun A1 Joo, Young-Chang A1 Lee, Taeyoon PB Royal Society of Chemistry (RSC) YR 2014 SN 2040-3364 SN 2040-3372 JF Nanoscale VO 6 IS 13 SP 7503 OP 7511 LK http://dx.doi.org/https://doi.org/10.1039/c3nr06771h DO https://doi.org/10.1039/c3nr06771h SF ELIB - SuUB Bremen
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