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Initial stage of atomic layer deposition of 2D-MoS2 on a Si..:
Shirazi, M.
;
Kessels, W. M. M.
;
Bol, A. A.
Physical Chemistry Chemical Physics. 20 (2018) 24 - p. 16861-16875 , 2018
Link:
https://doi.org/10.1039/c8cp00210j
RT Journal T1 <Title>Initial stage of atomic layer deposition of 2D-MoS2 on a SiO2 surface: a DFT study</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1039_c8cp00210j&Exemplar=1&LAN=DE A1 Shirazi, M. A1 Kessels, W. M. M. A1 Bol, A. A. PB Royal Society of Chemistry (RSC) YR 2018 SN 1463-9076 SN 1463-9084 JF Physical Chemistry Chemical Physics VO 20 IS 24 SP 16861 OP 16875 LK http://dx.doi.org/https://doi.org/10.1039/c8cp00210j DO https://doi.org/10.1039/c8cp00210j SF ELIB - SuUB Bremen
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