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Saturation profile based conformality analysis for atomic l..:
Yim, Jihong
;
Ylivaara, Oili M. E.
;
Ylilammi, Markku
...
Physical Chemistry Chemical Physics. 22 (2020) 40 - p. 23107-23120 , 2020
Link:
https://doi.org/10.1039/d0cp03358h
RT Journal T1 <Title>Saturation profile based conformality analysis for atomic layer deposition: aluminum oxide in lateral high-aspect-ratio channels</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1039_d0cp03358h&Exemplar=1&LAN=DE A1 Yim, Jihong A1 Ylivaara, Oili M. E. A1 Ylilammi, Markku A1 Korpelainen, Virpi A1 Haimi, Eero A1 Verkama, Emma A1 Utriainen, Mikko A1 Puurunen, Riikka L. PB Royal Society of Chemistry (RSC) YR 2020 SN 1463-9076 SN 1463-9084 JF Physical Chemistry Chemical Physics VO 22 IS 40 SP 23107 OP 23120 LK http://dx.doi.org/https://doi.org/10.1039/d0cp03358h DO https://doi.org/10.1039/d0cp03358h SF ELIB - SuUB Bremen
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