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1 Ergebnisse
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Epitaxial GaN using Ga(NMe2)3 and NH3 plasma by atomic laye..:
Rouf, Polla
;
O'Brien, Nathan J.
;
Buttera, Sydney C.
...
Journal of Materials Chemistry C. 8 (2020) 25 - p. 8457-8465 , 2020
Link:
https://doi.org/10.1039/d0tc02085k
RT Journal T1
Epitaxial GaN using Ga(NMe2)3 and NH3 plasma by atomic layer deposition
UL https://suche.suub.uni-bremen.de/peid=cr-10.1039_d0tc02085k&Exemplar=1&LAN=DE A1 Rouf, Polla A1 O'Brien, Nathan J. A1 Buttera, Sydney C. A1 Martinovic, Ivan A1 Bakhit, Babak A1 Martinsson, Erik A1 Palisaitis, Justinas A1 Hsu, Chih-Wei A1 Pedersen, Henrik PB Royal Society of Chemistry (RSC) YR 2020 SN 2050-7526 SN 2050-7534 JF Journal of Materials Chemistry C VO 8 IS 25 SP 8457 OP 8465 LK http://dx.doi.org/https://doi.org/10.1039/d0tc02085k DO https://doi.org/10.1039/d0tc02085k SF ELIB - SuUB Bremen
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