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Conformality of atomic layer deposition in microchannels: i..:
Yim, Jihong
;
Verkama, Emma
;
Velasco, Jorge A.
..
Physical Chemistry Chemical Physics. 24 (2022) 15 - p. 8645-8660 , 2022
Link:
https://doi.org/10.1039/d1cp04758b
RT Journal T1 <Title>Conformality of atomic layer deposition in microchannels: impact of process parameters on the simulated thickness profile</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1039_d1cp04758b&Exemplar=1&LAN=DE A1 Yim, Jihong A1 Verkama, Emma A1 Velasco, Jorge A. A1 Arts, Karsten A1 Puurunen, Riikka L. PB Royal Society of Chemistry (RSC) YR 2022 SN 1463-9076 SN 1463-9084 JF Physical Chemistry Chemical Physics VO 24 IS 15 SP 8645 OP 8660 LK http://dx.doi.org/https://doi.org/10.1039/d1cp04758b DO https://doi.org/10.1039/d1cp04758b SF ELIB - SuUB Bremen
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