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1 Ergebnisse
1
Machine learning in electron beam lithography to boost phot..:
Zhao, Rongbo
;
Wang, Xiaolin
;
Xu, Hong
..
Nanoscale. 16 (2024) 8 - p. 4212-4218 , 2024
Link:
https://doi.org/10.1039/d3nr04819e
RT Journal T1
Machine learning in electron beam lithography to boost photoresist formulation design for high-resolution patterning
UL https://suche.suub.uni-bremen.de/peid=cr-10.1039_d3nr04819e&Exemplar=1&LAN=DE A1 Zhao, Rongbo A1 Wang, Xiaolin A1 Xu, Hong A1 Wei, Yayi A1 He, Xiangming PB Royal Society of Chemistry (RSC) YR 2024 SN 2040-3364 SN 2040-3372 JF Nanoscale VO 16 IS 8 SP 4212 OP 4218 LK http://dx.doi.org/https://doi.org/10.1039/d3nr04819e DO https://doi.org/10.1039/d3nr04819e SF ELIB - SuUB Bremen
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