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Contact properties of a low-resistance aluminum-based elect..:
Jeon, Sori
;
Lee, Kwang-Heum
;
Lee, Seung-Hee
...
Journal of Materials Chemistry C. 11 (2023) 41 - p. 14177-14186 , 2023
Link:
https://doi.org/10.1039/d3tc02880a
RT Journal T1 <Title>Contact properties of a low-resistance aluminum-based electrode with metal capping layers in vertical oxide thin-film transistors</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1039_d3tc02880a&Exemplar=1&LAN=DE A1 Jeon, Sori A1 Lee, Kwang-Heum A1 Lee, Seung-Hee A1 Cho, Seong-In A1 Hwang, Chi-Sun A1 Ko, Jong Beom A1 Park, Sang-Hee Ko PB Royal Society of Chemistry (RSC) YR 2023 SN 2050-7526 SN 2050-7534 JF Journal of Materials Chemistry C VO 11 IS 41 SP 14177 OP 14186 LK http://dx.doi.org/https://doi.org/10.1039/d3tc02880a DO https://doi.org/10.1039/d3tc02880a SF ELIB - SuUB Bremen
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