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1 Ergebnisse
1
Effects of postannealing on the electrical properties of Ta..:
Chang, Chich-Shang
;
Liu, Tzu-Ping
;
Wu, Tai-Bor
Journal of Applied Physics. 88 (2000) 12 - p. 7242-7248 , 2000
Link:
https://doi.org/10.1063/1.1326464
RT Journal T1
Effects of postannealing on the electrical properties of Ta2O5 thin films deposited on TiN/T
UL https://suche.suub.uni-bremen.de/peid=cr-10.1063_1.1326464&Exemplar=1&LAN=DE A1 Chang, Chich-Shang A1 Liu, Tzu-Ping A1 Wu, Tai-Bor PB AIP Publishing YR 2000 SN 0021-8979 SN 1089-7550 JF Journal of Applied Physics VO 88 IS 12 SP 7242 OP 7248 LK http://dx.doi.org/https://doi.org/10.1063/1.1326464 DO https://doi.org/10.1063/1.1326464 SF ELIB - SuUB Bremen
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