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1 Ergebnisse
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Electrical characteristics and thermal stability of n+ poly..:
Lim, Kwan-Yong
;
Park, Dae-Gyu
;
Cho, Heung-Jae
...
Journal of Applied Physics. 91 (2002) 1 - p. 414-419 , 2002
Link:
https://doi.org/10.1063/1.1425073
RT Journal T1
Electrical characteristics and thermal stability of n+ polycrystalline- Si/ZrO2/SiO2/Si metal–oxide–semiconductor capacitors
UL https://suche.suub.uni-bremen.de/peid=cr-10.1063_1.1425073&Exemplar=1&LAN=DE A1 Lim, Kwan-Yong A1 Park, Dae-Gyu A1 Cho, Heung-Jae A1 Kim, Joong-Jung A1 Yang, Jun-Mo A1 Choi, II-Sang A1 Yeo, In-Seok A1 Park, Jin Won PB AIP Publishing YR 2002 SN 0021-8979 SN 1089-7550 JF Journal of Applied Physics VO 91 IS 1 SP 414 OP 419 LK http://dx.doi.org/https://doi.org/10.1063/1.1425073 DO https://doi.org/10.1063/1.1425073 SF ELIB - SuUB Bremen
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