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Evaluation of silicon surface nitridation effects on ultra-..:
Nieh, Renee
;
Choi, Rino
;
Gopalan, Sundar
...
Applied Physics Letters. 81 (2002) 9 - p. 1663-1665 , 2002
Link:
https://doi.org/10.1063/1.1504165
RT Journal T1
Evaluation of silicon surface nitridation effects on ultra-thin ZrO2 gate dielectrics
UL https://suche.suub.uni-bremen.de/peid=cr-10.1063_1.1504165&Exemplar=1&LAN=DE A1 Nieh, Renee A1 Choi, Rino A1 Gopalan, Sundar A1 Onishi, Katsunori A1 Kang, Chang Seok A1 Cho, Hag-Ju A1 Krishnan, Siddarth A1 Lee, Jack C. PB AIP Publishing YR 2002 SN 0003-6951 SN 1077-3118 JF Applied Physics Letters VO 81 IS 9 SP 1663 OP 1665 LK http://dx.doi.org/https://doi.org/10.1063/1.1504165 DO https://doi.org/10.1063/1.1504165 SF ELIB - SuUB Bremen
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