I agree that this site is using cookies. You can find further informations
here
.
X
Login
Merkliste (
0
)
Home
About us
Home About us
Our history
Profile
Press & public relations
Friends
The library in figures
Exhibitions
Projects
Training, internships, careers
Films
Services & Information
Home Services & Information
Lending and interlibrary loans
Returns and renewals
Training and library tours
My Account
Library cards
New to the library?
Download Information
Opening hours
Learning spaces
PC, WLAN, copy, scan and print
Catalogs and collections
Home Catalogs and Collections
Rare books and manuscripts
Digital collections
Subject Areas
Our sites
Home Our sites
Central Library
Law Library (Juridicum)
BB Business and Economics (BB11)
BB Physics and Electrical Engineering
TB Engineering and Social Sciences
TB Economics and Nautical Sciences
TB Music
TB Art & Design
TB Bremerhaven
Contact the library
Home Contact the library
Staff Directory
Open access & publishing
Home Open access & publishing
Reference management: Citavi & RefWorks
Publishing documents
Open Access in Bremen
zur Desktop-Version
Toggle navigation
Merkliste
1 Ergebnisse
1
Ultrahigh-density, nonlithographic, sub-100 nm pattern tran..:
Matsuura, Naomi
;
Simpson, Todd W.
;
Mitchell, Ian V.
...
Applied Physics Letters. 81 (2002) 25 - p. 4826-4828 , 2002
Link:
https://doi.org/10.1063/1.1527693
RT Journal T1
Ultrahigh-density, nonlithographic, sub-100 nm pattern transfer by ion implantation and selective chemical etching
UL https://suche.suub.uni-bremen.de/peid=cr-10.1063_1.1527693&Exemplar=1&LAN=DE A1 Matsuura, Naomi A1 Simpson, Todd W. A1 Mitchell, Ian V. A1 Mei, Xiang-Yang A1 Morales, Patrick A1 Ruda, Harry E. PB AIP Publishing YR 2002 SN 0003-6951 SN 1077-3118 JF Applied Physics Letters VO 81 IS 25 SP 4826 OP 4828 LK http://dx.doi.org/https://doi.org/10.1063/1.1527693 DO https://doi.org/10.1063/1.1527693 SF ELIB - SuUB Bremen
Export
RefWorks (nur Desktop-Version!)
Flow
(Zuerst in
Flow
einloggen, dann importieren)