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1 Ergebnisse
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Characterization of CF4-plasma fluorinated HfO2 gate dielec..:
Lai, Chao Sung
;
Wu, Woei Cherng
;
Wang, Jer Chyi
.
Applied Physics Letters. 86 (2005) 22 - p. , 2005
Link:
https://doi.org/10.1063/1.1944230
RT Journal T1
Characterization of CF4-plasma fluorinated HfO2 gate dielectrics with TaN metal gate
UL https://suche.suub.uni-bremen.de/peid=cr-10.1063_1.1944230&Exemplar=1&LAN=DE A1 Lai, Chao Sung A1 Wu, Woei Cherng A1 Wang, Jer Chyi A1 Chao, Tien sheng PB AIP Publishing YR 2005 SN 0003-6951 SN 1077-3118 JF Applied Physics Letters VO 86 IS 22 LK http://dx.doi.org/https://doi.org/10.1063/1.1944230 DO https://doi.org/10.1063/1.1944230 SF ELIB - SuUB Bremen
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